ur company specializes in the development, sales, and commercialization of advanced microelectronics through cutting-edge technologies, including Multi Electron Beam Direct Write Lithography (MEB-DWL) systems. With a strong focus on innovation and precision, we provide industry-leading solutions for the semiconductor and microelectronics sectors. The MEB-DWL technology is a next-generation patterning tool that enables highly accurate and efficient direct-write lithography for producing intricate microstructures at nanoscale dimensions. By utilizing multiple electron beams in parallel, our systems dramatically enhance throughput and resolution, making them ideal for applications in advanced semiconductor manufacturing, photonic devices, MEMS (Microelectromechanical Systems), and more.