Wednesday, May 2025

10:40 AM - 11:00 AM

Room: 220C

Session: AR Waveguide II

High-Uniformity Full-Color Waveguides Fabricated by Nanoimprint Lithography for Near-Eye Display

Invited

• Yu-Ting Hu

  AUO Corporation

Description:

Surface relief gratings offer the advantages of well-defined structure and can be mass produced using Nanoimprint Lithography (NIL). In this article, we propose an optimal folding partition design and fabricate a waveguide using NIL. After prototyping, we achieved a full-color waveguide delivering up to 880 nits/lumen and high uniformity, demonstrating its potential for applications in AR glasses.