Tuesday, May 2025

12:10 PM - 12:30 PM

Room: LL21CD

Session: Display Manufacturing Using Metal Oxide

Finetuning the Microstructure of Metal-Oxide Targets to Optimize Sputter Behavior for Thin Films in TFT

• Hennrik Schmidt

  Plansee USA LLC

Description:

Films of Molybdenum- and Tungsten-Oxides are used as low reflection dark layers to cover thin metal line as well as high work-function materials. Due to their nature as sub stoichiometric oxides with composition tailored to specific applications, sputter targets used in the process compose of different material phases on the micrometer scale. We study the impact of microstructure on the sputter behavior.