11:10 AM - 12:30 PM

• (4) Display Manufacturing Using Metal Oxide

  at LL21CD

  Chairs: Andriy Romanyuk, Jakob Bollhalder

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11:10 AM - 11:30 AM

• (4.1) Enabling Next-Generation Metal-Oxide Backplane Technology by Atomic Layer Deposition

  at LL21CD

  Speakers: Dejiu Fan

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11:30 AM - 11:50 AM

• (4.2) State-of-the-Art Gas Separation Function in Dynamic New Aristo TWIN PVD System Proven with IGZTO-IGZO Dual-Layer Thin-Film Transistor

  at LL21CD

  Speakers: You-Ron Lin

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11:50 AM - 12:10 PM

• (4.3) Silicon-Oxide Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition for High-Mobility Oxide TFT

  at LL21CD

  Speakers: Myung soo Huh

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12:10 PM - 12:30 PM

• (4.4) Finetuning the Microstructure of Metal-Oxide Targets to Optimize Sputter Behavior for Thin Films in TFT

  at LL21CD

  Speakers: Hennrik Schmidt

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